EUV Lithography & EUV Chucks

Lightweighted and low-expansion chucks with 10nm active-area flatness

  • are required in EUV lithographic tools.
  • These chucks also have low outgassing and low particle generation.

The below is a reticle chuck;

Electrogrip also provides wafer chucks of similar flatness:

For great solutions and experienced support ...

Contact